The Institute of Applied Optics (ITO) at the University of Stuttgart has a strong background in optical metrology, diffractive optics, optics simulation and design. In this project, the doctoral candidate (DC) will explore high-resolution interferencelithography processes for the generation of large linear gratings with diffractionlimited performance. This includes research on the optimal lithography process as well as new calibration approaches for SBIL systems. Investigation of methods to achieve nanometer level placement accuracy at high patterning speeds e.g. using fringe locking techniques. A new interferometric metrology system for the verification of the diffraction-limited performance of large area pulse compressors based on grating weaveguide structures will be established. Close cooperation with design (DC 1), etching (DC 14) as well as replication (DC 9).
Specific requirements: We are looking for candidates with an excellent master’s degree in optics, photonics or electric engineering, physics or comparable. Basic programming skills in Python, C++ and/or Matlab are required. Good understanding of interferometry, cleanroom processes and control theory beneficial. We offer a PhD position in an open, cooperative atmosphere where initiative and own ideas are highly welcome.
Eligibility criteria: There are strict eligibility requirements within Marie Skłodowska-Curie Doctoral Networks. At the time of appointment, applicants must not have resided or carried out their main activity (work, studies) in the country for more than 12 months in the 3 years immediately before their appointment; AND shall also be in the first four years of their research careers at the time of appointment and have not been awarded a doctoral degree. We are looking forward to your application! Please also consider the positions of our network partners. Details of each project can be found below or via the IFSW website: http://www.ifsw.uni-stuttgart.de/.
Selection process: Applicants will need to submit to trades@ifsw.uni-stuttgart.de, for each application:
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